Used NAPSON NC-3000F #9085605 for sale

NAPSON NC-3000F is a highly advanced and reliable mask and wafer inspection equipment designed for use in the microelectronics and semiconductor industries. The system is equipped with a choice of either a field emission scanning electron microscope (FESEM) or a normal imaging option in order to provide the highest resolution imaging available. NC-3000F has a maximum resolution of up to 2µm and can achieve a scanning accuracy of 0.1µm line/space, meaning that it is capable of inspecting extremely small features and masking requirements. It is equipped with a variety of adjustable parameters to help optimize the inspection process and ensure superior image quality. Along with its high resolution imaging capabilities, NAPSON NC-3000F also has a robust automated wafer inspection unit which can accurately acquire autofocus images of up to 1000 wafers per second. The machine utilizes a proprietary Brightfield Inspection technology that can easily identify yield defects due to scratches, contamination, incomplete lithography, or other problems. The intuitive features of NC-3000F make it an ideal choice for highly challenging and demanding microelectronic imaging applications. It is equipped with a number of automatic functions such as multiple mask alignment, white light interference correction, and other advanced image analysis options. Additionally, the tool is equipped with a high-accuracy stage to facilitate accurate and repeatable wafer alignment. In conclusion, NAPSON NC-3000F mask and wafer inspection asset is an ideal tool for high-precision imaging applications. Its advanced imaging capabilities, automated image acquisition, and intuitive features make it a powerful model that delivers a high level of accuracy and repeatability.