Used NAPSON NC-3000F #9123347 for sale

NAPSON NC-3000F is a powerful mask and wafer inspection equipment designed to increase quality and reduce costs in the fabrication of semiconductors. The system offers full-field, simultaneous capture of both mask and wafer features, using automatic, precision optical inspection and monitoring of mask and wafer patterns. The unit employs proprietary advanced technology combined with modular hardware configuration and industry solutions, enabling improved qualitative and quantitive performance. The machine operates with three primary components, a precision optical imager combined with a special optics package and a vast data collection software library. NC-3000F uses a proprietary imaging tool featuring high dynamic range, high signal-to-noise ratio, and energy-efficient laser excitation for unsurpassed resolution and dynamic range. The optics package features a dual exposure capability, allowing for simultaneous mask and wafer inspection. The vast data library includes fully-automated and customizable software that enables comprehensive analysis and customizable report generation. NAPSON NC-3000F also has multiple inspection modes, including Automated Mask Inspection (AMI), Mask-to-wafer Registration (MWR), and optical flight testing (OFT). AMI provides high-speed evaluation of mask patterns, from both top-side and bottom-side patterns, and offers the choice of planar and/or 3D auto inspection. MWR automatically aligns mask and wafer patterns for improved accuracy and quality. OFT allows for automated performance of multiple, non-destructive, optical flight tests on the sample patterns, providing the user with reliable and repeatable data. The asset also includes a 4-axis, XYZ-theta Stages enabling high-precision alignment of mask and wafer structures, reducing costs associated with mask data verification and correction process time and improving yield. Automated alignment allows for repeatability, stability, precision, and accuracy. Additionally, the model features advanced Light Source Interference Metrology for accurate performance and characterization. The integrated High-Speed Pattern Matching (HSSPM) equipment offers pattern recognition accuracy and repeatability. NC-3000F is an effective and versatile tool, offering a comprehensive array of imaging, registration, and inspection capabilities. It is designed to save costs and increase quality in semiconductor fabrication processes. This system is suitable for a wide range of applications in both laboratory and industrial settings and is designed with the highest level of safety and reliability.