Used NAPSON PN-50∝ #9153438 for sale

NAPSON PN-50∝ is a next-generation production-oriented mask and wafer inspection equipment. The system provides a comprehensive array of capabilities, including high-quality multi-field wafer inspection, image capture and analysis, defect mapping and scoring, alignment, overlay and printability assessment. The unit is designed to support a wide range of production applications, with a focus on high-precision inspection, defect identification and defect overlay assessment. The machine is equipped with a state-of-the-art camera tool that features a full-frame RGB sensor capable of capturing images with a pixel resolution up to 2,488 x 1,764, with 50 mm depth of field. Additionally, the asset offers an automated stage that can scan an entire wafer in less than a minute. Equipped with a high-resolution 10-megapixel color camera, PN-50∝ provides operators with the capability to reliably capture and analyze images of defects, such as particle contamination or stain defects on the wafer. Furthermore, the model's advanced optical configuration allows operators to generate large-scale overlays with accuracy and reliability. The equipment also includes a suite of pattern comparison software tools that can compare actual mask features with expected patterns. This can help locate areas of potential alignment issues, false contacts, and other potential mask design problems. Additionally, the system can be used for automated lithography process qualification, evaluation of process variations, and training of new operators to enhance the product design and manufacture process. In addition, NAPSON PN-50∝ is also equipped with the latest optical alignment and overlay (OAO) technology, with a 10-mm wide field of view. This OAO technology can be used to accurately identify different types of defects, such as particles, dust, and other issues, and provide potential solutions. With OAO and a 50-mm depth of field, the unit can detect mask defects, line-edge roughness, pattern non-conformity, and even minor dimension errors. PN-50∝ masks and wafer inspection machine is an ideal choice for manufacturers seeking quality assurance, efficient production and accuracy. This tool provides the tools needed to ensure quality inspections, defect identification and defect overlay assessments. With its state-of-the-art optical alignment and overlay capabilities, NAPSON PN-50∝ is a reliable and powerful solution for production-oriented mask and wafer inspection.