Used NAPSON RG-7B #9181631 for sale
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NAPSON RG-7B is a mask & wafer inspection equipment designed for the industrial semiconductor fabrication process. It is built with the latest state-of-the-art technologies to provide fast, reliable and accurate inspection capabilities for the most demanding production environments. The system comes equipped with a high-resolution wafer stage that is capable of horizontal and vertical scanning, enabling the unit to inspect tiny features and structures on the wafer surface. The machine also features a robust image processing software that can detect even the slightest defect, allowing the user to easily identify and analyze any possible danger areas on the mask or wafer. RG-7B is equipped with multiple light sources, including UV, visible, infrared, monochrome and multi-wavelength illumination. This ensures that the tool can accurately and reliably detect any possible defects due to abnormal exposure to damaging light sources. The asset comes with a built-in calibration model to ensure that the equipment is always working at its optimal level and delivers precise results every time. NAPSON RG-7B is also equipped with a wide variety of detection modes ranging from the standard bright-field detection with dark-field inspection, to reflective, shadow, contrast enhanced, and advanced high-light imaging detection modes. This broad range of detection modes allows the system to be used in many different production environments, from the most advanced and precision-controlled quality control systems to less demanding situations. In addition, the unit is optimized for low noise operation to allow for a comfortable and non-disruptive user experience. It also features a simplified user-interface that allows even the least experienced users to comfortably operate the machine. Its high-speed processing capabilities also make RG-7B a great choice for high-volume inspection scenarios since it can handle large amounts of data without loss of accuracy. All of these features make NAPSON RG-7B the perfect choice for any semiconductor fabrication facility since it provides superior image processing performance, reliable detection capabilities, and an intuitive user-interface. Its robust and advanced design ensures that the tool will last for years to come, providing reliable and accurate wafer and mask inspections anytime and anywhere.
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