Used NEUVIS (Mask & Wafer Inspection) for sale

NEUVIS is a renowned manufacturer of mask and wafer inspection equipment, delivering top-notch technology to the semiconductor industry. Their inspection systems are equipped with analogues of the latest imaging technologies, ensuring accurate detection and analysis of defects in masks and wafers. One of the top advantages of NEUVIS inspection units is their exceptional sensitivity, allowing for the detection of even the tiniest defects. The machines utilize advanced image recognition and processing algorithms, providing superior accuracy in defect identification. Furthermore, NEUVIS tools offer high throughput speeds, ensuring efficient and rapid inspection processes. One prominent example of their mask and wafer inspection system is the IR2R. This system utilizes infrared radiation for defect detection, enabling it to identify defects that are invisible to visible light-based assets. The IR2R offers a significant advantage in the detection of subpixel defects and delivers highly precise results. NEUVIS inspection models also excel in evaluating the critical dimension (CD) of masks and wafers. They accurately measure the CD parameters, ensuring the quality and performance of semiconductor devices. To summarize, NEUVIS mask and wafer inspection equipment boast advanced analogues, superior defect detection capabilities, high throughput speeds, and precise CD measurement. The IR2R is a prominent example, showcasing NEUVIS's expertise in utilizing infrared radiation for defect identification.