Used NIKON 2A #77230 for sale
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ID: 77230
Wafer Size: 4", 5", 6"
Optistation, 4", 5" and 6", BD Plan 10x, 20x and 40x objectives.
NIKON 2A is a Mask and Wafer inspection equipment developed by NIKON optical microelectronics technology team. It is designed to perform the most accurate inspection of the finest cellular circuit patterns on masks, wafers, and free-standing films. The core of 2A is an advanced optical design integrating two laser systems. The first laser system is a Koehler substrate variance, designed to pick up subtle minute pattern variations in masks, wafers, and free-standing films. The second laser unit employs an ultra-high precision objective to accurately capture latent defects, such as small grains and dark-field patterns, and to provide sub-1μm resolution. By combining these two systems with a fully automated image analysis machine, NIKON 2A can provide a comprehensive inspection of complex masks, wafers, and free-standing films. Its advanced optical design and automated imaging tool incorporates a high-contrast resolution and a larger field of view. This allows for quick, accurate analysis of sub-micron patterns and defects on masks and substrates. In addition, 2A includes an optional scanning asset, allowing for inspection and analysis of dynamic transformation of substrates in various stages of the manufacturing process. NIKON 2A's imaging model is capable of providing simultaneous 2D and 3D information, and of detecting both surface and buried defects. It is capable of detecting defect shapes at any angle and of automatically calibrating them to a specified size. Finally, the equipment provides detailed defect analysis, including size, shape, and quality. The robust hardware design featured in 2A is designed with maximum reliability and easy maintenance. Its advanced automation enables easy and intuitive setup, while its intuitive user-interface facilitates easy operation and control. In short, NIKON 2A is a reliable and highly accurate mask and wafer inspection system. It is capable of accurately identifying minute pattern variations and detecting latent defects on masks, wafers, and standing films. 2A provides powerful image analysis and calibration, as well as detailed defect analysis and intuitive user-interface. Its robust design guarantees maximum reliability and easy maintenance.
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