Used NIKON AMI-3300 #9411434 for sale
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NIKON AMI-3300 is a top-of-the-line mask and wafer inspection equipment designed to deliver exceptional image quality and measurement precision in a cost-effective package. It offers high-quality imaging, a range of measurement options, and a suite of integrated software tools to enable advanced data analysis. The main components of AMI-3300 system include an imaging head, a lighting control unit, a wafer/mask stage, a control unit, an analysis unit, and an optical microscope. The imaging head captures an image at maximum resolution and pixel density with low noise artifacts and low dark noise levels. The lighting control unit enables flexible control of the illumination source and can be used to enable a range of light intensities, colors, and patterns. The wafer/mask stage is designed to support any size of wafer/mask and offers stable, low-vibration operation and high accuracy. The unit also provides a range of high speed scanning modes, allowing for rapid imaging and analysis of samples. NIKON AMI-3300 machine provides a comprehensive suite of software tools that facilitate automated data acquisition and analysis. These include image capture and analysis, automatic defect detection and classification, measurements of line widths, thicknesses, and other physical properties, and a range of other data analysis and visualization options. The user interface of AMI-3300 tool is intuitive and easy to use, and the machine is compatible with a range of file formats and interfaces, making it easy to integrate with other systems and software tools. The machine is designed for quick setup, with a high-precision alignment asset and automated calibration routines. The model also provides detailed traceability of all equipment settings and results. Overall, NIKON AMI-3300 is an excellent choice for mask and wafer inspection, offering reliable image quality, robust performance, and a suite of advanced software tools for automated data acquisition and analysis. It is a cost-effective solution for any environment where advanced mask and wafer inspection capabilities are needed.
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