Used NIKON NRM-3100 #9386878 for sale

NIKON NRM-3100 is a state-of-the-art mask and wafer inspection equipment designed for economical high resolution surface inspection. By combining a reflected optical system design with powerful optics and camera options, NRM-3100 achieves high resolution imaging over a large field of view up to 12 inches. The unit can inspect a variety of key topographical features commonly encountered in mask and wafer production as well as detailed defects invisible to the human eye. NIKON NRM-3100 is equipped with advanced optics and a motorized stage to facilitate accurate imaging of large samples. The optics machine consists of a broadband illumination source, lenses and a high resolution camera mounted on an adjustable z-axis stage by radial arms. The radial arms allow for easy adjustment and alignment of the optics tool with the target sample. Additionally, an automated focus mechanism reduces measurement setup time and ensures highest resolution imaging through every stage of inspection. NRM-3100 offers a versatile image capture approach to wafer and mask inspection by combining bright field, dark field, and Koehler illumination techniques with LED and diffraction grating illumination sources for each technique. This combination of illumination sources enhances signal to noise ratio and allows for more accurate detection of even the most challenging defects. Additionally, multiple wavelength technology allows the asset to measure a variety of defect types with high sensitivity without the need for physical filters. Advanced no-zone optics and multi-shot imaging also ensures accurate depth measurements of each inspection site in order to accurately identify and locate raised defect features on samples. NIKON NRM-3100 is also equipped with a unique dual view optics model, allowing it to take multiple images of the same inspection site from two different angles in order to filter out false alarms. NRM-3100 utilizes a powerful and flexible inspection software package for analyzing inspection results. This advanced software enables mask and wafer engineers to quickly and accurately identify potential defects and provides a wide range of filtering options for categorizing defects which ensures accurate defect counting. In conclusion, NIKON NRM-3100 is a powerful and cost effective mask & wafer inspection equipment that makes high resolution imaging of large samples possible with accuracy and reliability. By combining advanced optical and imaging technologies, NRM-3100 ensures the highest quality inspection even when inspecting challenging samples.