Used NIKON NRM-3100 #9401531 for sale

ID: 9401531
Wafer Size: 12"
Overlay measurement system, 12".
NIKON NRM-3100 is a highly precise mask and wafer inspection equipment designed to detect defects with exceptional accuracy. It has a highly sensitive, high-resolution mini-lithography system that is capable of resolving nanometer-level defects. The unit boasts a 50nm resolution, an Nano-overexposed Detection Dynamism of 4,500:1 and a high throughput rate of up to 4,500 wafers per hour. NRM-3100 can be used for both reticle and wafer inspection and its expandable platform allows for the detection of both small and large patterns on the same device. NIKON NRM-3100 features a built-in Automated Operation Machine (AOS) which accelerates the mask/wafer inspection process and minimizes the time required for completion. It is designed to give comprehensive inspection results in minutes, by its use of automated pattern recognition, defect recognition and analysis. The highly accurate, high-speed automatic measurement of patterns, values, and defects enable the user to quickly identify and repair any issue. NRM-3100's advanced optics tool utilizes an auto focus image acquisition asset and programmable motorized stage that offers excellent control over accuracy and speed throughout the inspection process. This model's excellent field-of-view is designed to provide operators an optimized experience in determining variance between wafers. NIKON NRM-3100 also features an intuitive graphical user interface (GUI) to streamline user interaction with the equipment. This user-friendly interface enables the operator to view and modify system settings quickly and easily, allowing for quick turnaround performance time. Furthermore, NRM-3100 is the only unit equipped with NIKON non-contact static defect measurement module, which accurately measures and records static defects from wafer edges. Overall, NIKON NRM-3100 is an advanced mask and wafer inspection machine capable of delivering detailed results. It is equipped with a high-end Mini-Lithography tool, and provides a high-resolution inspection to detect the smallest defects, combined with support for automated operations to get the job done faster. Additionally, the convenient graphical user interface and static defect measurement module makes NRM-3100 the ideal choice for precise, reliable and cost-effective wafer inspection.
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