Used NIKON Optistation 1A #9111520 for sale

NIKON OptiStat 1A Mask & Wafer Inspection Equipment is a revolutionary integrated system designed to provide a complete solution for efficient optical analysis of mask and wafer patterns. This comprehensive mask inspection unit uses advanced optical technology to deliver both automated and manual inspection capabilities. The OptiStat 1A includes a 300mm × 200mm field-of-view widefield microscope with a 3X optical zoom, and an F-Theta-Zoom lens that enables lateral movement of the field-of-view and uniform magnification up to 500X for optimized imaging. The machine also integrates a high-resolution multi-spectral imaging channel for accurate identification of critical defects. The OptiStat 1A tool provides comprehensive inspection capabilities including automatic focus and fine adjustment, built-in image robustness filters, and versatile, cross-depth-of-field analysis for users to acquire and analyze fully optimized images quickly and accurately. NIKON advanced measurement, analysis, and review algorithms allow for precise and reliable assessment of features such as line-edge roughness, line-width variation, profile, and line-width accuracy. Also, the asset's fully automated Point & Click defect identification feature enables easy detection of defects, making it suitable for lithographic quality assurance operations. NIKON OptiStat 1A model integrates state-of-the-art optics combined with enhanced imaging technologies to deliver optimal results for both mask and wafer pattern inspection and evaluation applications. The equipment's advanced image processing features, flexible software architecture, and intuitive graphical user interface provide users with more complete control and precision when inspecting mask and wafer patterns. Furthermore, the system's high-throughput design allows for the quick and efficient analysis of large numbers of mask and wafer patterns. NIKON OptiStat 1A is an essential tool for ensuring the highest possible fabrication quality in mask and wafer pattern inspection and analysis. It is a versatile and comprehensive unit, perfect for both research and production-level inspection requirements. Additionally, the machine's comprehensive design and user-friendly operations make it ideal for users who require fast and reliable evaluations and accurate defect detection.