Used NIKON Optistation 2 #9111297 for sale

NIKON Optistation 2 is a mask and wafer inspection equipment that provides high accuracy and ultra-fast access to critical wafer and mask information. It is designed to automate the process of inspecting a wide variety of lithography masks, substrates and related components. This system utilizes advanced technologies to detect defects in wafers, substrates and masks with unprecedented accuracy and speed. Optistation 2 incorporates a highly sophisticated architecture allowing it to process parallel requests in real-time. An intuitive user interface is available to simplify the process of detecting patterns, performing advanced search queries, and inspecting large batches of substrates, masks and wafers. NIKON Optistation 2 offers several advanced features that make it an excellent choice for semiconductor manufacturers. The unit includes an automated optical inspection (AOI) capability which is designed to detect microscopic errors and crack patterns. This feature allows the Optistations to quickly identify errors in the production line. Furthermore, the machine offers a unique stitching algorithm which allows for automatic alignment of patterns across overlapping areas of a substrate or mask. Another advanced feature of Optistation 2 is its modular design. The tool includes a multi-head scanning asset allowing the implementation of multiple sample processing in a single setup. Furthermore, its powerful wafer mapping software enables NIKON Optistation 2 to accurately map areas of defects or errors within the substrates or masks. Optistation 2 is the perfect solution for high accuracy and fast detection of errors and defects. Its advanced features coupled with its intuitive user interface make it an ideal choice for semiconductor manufacturers who need to quickly and accurately inspect their product line. NIKON Optistation 2 can easily identify errors, patterns, and defects in lithography masks, substrates, and components with unprecedented accuracy and speed.