Used NIKON Optistation 3 #293594406 for sale

ID: 293594406
Vintage: 1998
Wafer inspection system 1998 vintage.
NIKON Optistation 3 is a comprehensive mask and wafer inspection equipment designed to provide efficient and reliable inspection of resists, sputtered films, lithographic processes and wafers during semiconductor fabrication. It features a modular design that supports both inline and offline configurations, as well as a wide range of mask and wafer types. The core of NIKON OPTISTATION-3 system is its high power optical unit, featuring an advanced optical head and four imaging levels. The optics utilize NIKON advanced broad-band multi-segment LED illumination and up to 5x optical zoom. It is capable of inspecting up to 16" x 20" mask or wafer fields of view, and can detect features down to 0.2μm with a single exposure. It also features advanced software technologies such as fast image processing and analysis, and automated process control, allowing for faster and more accurate inspections. Its high-speed image capture and 3D Spatial Image Correlation (SIC) technology eliminate false positives, while its Pattern Matching Technology (PMT) ensures repeatable results. Optistation 3 also includes a suite of review and logging tools that support both laboratory and inline inspection needs. It can provide comparative data correlation across multiple mask images, as well as across multiple wafer layers. It also features an integrated database that allows for quick retrieval and storage of inspection results. The machine is compliant with SEMI specifications and is designed to improve turnaround time and reduce costs. Its broad compatibility enables it to integrate with other factory automation processes, such as GDSII file streaming and design layout comparison. Finally, an intuitive user interface and comprehensive documentation make OPTISTATION-3 easy to use and operate. In summary, NIKON Optistation 3 is a powerful, flexible and reliable mask and wafer inspection tool that provides superior accuracy and repeatability. Its high power optical asset, advanced software technologies and a suite of review and logging tools enable it to address multiple semiconductor fabrication requirements. Moreover, its compliance with SEMI specifications, broad compatibility and user-friendly interface make it a suitable solution for a variety of mask and wafer inspection needs.
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