Used NIKON Optistation 3100 #293587009 for sale

NIKON Optistation 3100 is a high-precision, automated mask and wafer inspection equipment for sub-micron technologies. The system features a large working area, precise rotary stages, and a variety of optional quality assurance supports. It is designed to meet the requirements of IC manufacturers, semiconductor design companies, and test/inspection laboratories. With cutting-edge illumination and imaging technology, NIKON OPTISTATION-3100 is capable of inspecting both wafers and masks with extremely high accuracy, ensuring that the most stringent of device and component requirements are met. Optistation 3100 incorporates a high-resolution long-working distance metrology microscope with a total of 8 axes of motion, allowing it to inspect a wide range of mask and wafer patterns in both two and three-dimensional settings. It has an 0.005mm scanning resolution, with a maximum field of view of 200mm x 200mm. Together with its powerful lighting engine, the motion stages are able to make precise and repeatable movements, allowing it to accurately measure mask geometries and edge profiles down to the sub-micron level. OPTISTATION-3100 is controlled by NIKON innovating imaging and analysis software. The unit is capable of visualizing virtually any type of defect with crisp, high-resolution images. Additionally, it features powerful analysis tools, including variables such as overlay, critical dimension, defect review, auto-correction, registration, and multiple measurement functions. This allows users to classify and sort images into different groups or types, effectively or automatically target areas of interest, and make automated decisions on pass/fail criteria. In addition to its imaging capabilities, NIKON Optistation 3100 includes an array of advanced feature testing and pattern simulation processes. It can detect various types of defects such as missed intersections, overhangs, edge losses, and mazes. The machine can also mimic/model patterns based on predefined rules, which can be used as reference patterns for further comparisons. NIKON OPTISTATION-3100 also features an automated alignment tool to ensure accurate subsequent inspection. An intuitive user interface and versatile calibration methods further simplify setup, transfer, and operation. In conclusion, Optistation 3100 is an ideal choice for high-precision mask and wafer inspection. With its cutting-edge imaging and analysis capabilities, it ensures reliable defect detection and device conformity.