Used NIKON Optistation 3100 #293587898 for sale

NIKON Optistation 3100 is a leading edge mask and wafer inspection equipment designed to enable chip manufacturers and mask makers to quickly and accurately detect defects at the wafer and mask stage. NIKON OPTISTATION-3100 is a powerful and versatile system that utilizes the latest advances in imaging and image processing technology. It is capable of doing a wide variety of inspections, ranging from optical and electron-beam imaging to automated test pattern inspection. The software is specifically designed to provide tests that are highly reliable and accurate at all stages of production. Optistation 3100 utilizes a combination of a digital image board, dual optical imaging systems, and two electron beam systems to quickly and accurately detect defects. The unit is capable of magnifying up to 1000X and can detect defects down to 0.5μm. It also includes a powerful pattern matching machine that enables even the most complex patterns to be quickly and accurately detected. The tool is incredibly user friendly and designed to provide a low learning curve for operators. The asset has a flexible EDX analysis suite to provide complete end-of-line testing. The software supports an extensive range of image output formats including HTML, JPEG and PSD. OPTISTATION-3100 is also capable of running inspection tests in parallel, allowing multiple tasks to be conducted at the same time. This can significantly reduce the amount of time needed for testing and helps to streamline the workflow process. In addition, the model has a powerful equipment reporting capability that can be used to track performance and provide detailed data on the system's performance. NIKON Optistation 3100 can also generate reports in multiple formats to fit a variety of uses. In summary, NIKON OPTISTATION-3100 is a powerful and versatile unit designed to meet the needs of chip manufacturers and mask makers. It uses the latest advances in imaging and image processing technology to quickly and accurately detect defects at the wafer and mask stage. It has a user friendly interface, a flexible EDX analysis suite and the capability to generate reports in multiple formats.