Used NIKON Optistation II #9307809 for sale

NIKON Optistation II is a mask and wafer inspection equipment designed for lithographic production. With its state-of-the-art illumination and imaging technology, it enables reliable, high-precision measurements with extremely low noise levels for applications in the microelectronic industry. The system features a brightfield transmitted illumination module that functions as a light source for imaging applications. It provides excellent contrast for clear imaging and signals free from interference between the detector and pattern. Its robust, stable structure is designed to remain uniform over a wide field range of more than 200 µm. The inspection unit also includes an easy-to-use maXelerator stage that provides rapid, smooth movement and precise, repeatable positioning. It is capable of scanning large areas, such as a full wafer in one single movement, while accurately calculating intermediate points along the way. Optistation II provides a range of advanced quantitative image analysis capabilities for accurate and repeatable defect detection. It can recognize a variety of parameters such as line width, edge position, line roughness, and defect size for accurate measurement and diagnosis. The machine is based on a one-shot exposure, quick-view alignment technique that allows the user to rapidly identify, align, and measure defensive patterns on wafers. It is equipped with an integrated measurement technology which is combined with high-speed scanning seamlessly under software control to optimize throughput and accuracy. Overall, NIKON Optistation II provides a powerful and reliable mask and wafer inspection tool that can efficiently inspect pattern images with high-precision. It is also capable of quickly searching and accurately measuring defensive patterns on wafers under software control. With its robust design and advanced imaging technology, it is an ideal solution for lithographic production.