Used NIKON Optistation III #293629211 for sale

NIKON Optistation III is a highly sophisticated mask and wafer inspection equipment that is designed to accurately analyze, detect, and measure the greatest difference in defect density on the photographic images of the mask and the substrate. This system features the world's top-end "NIKON OPTISTATION-III" platform, which utilizes advanced optics and a high-speed image processing unit, as well as a comprehensive suite of advanced image processing and analysis software programs for analyzing each mask and wafer. This machine is also capable of detecting up to 0.1µm line-edge roughness and can identify microscopic defects on the substrate as small as 20nm. Additionally, Optistation III capabilities include: overlay/CD measurement; pattern area and POL defect inspection; advanced edge recognition and non-contact aerial image technology. This tool also comes with an impressive array of software tools for advanced image analysis and for image segmentation, allowing for precise mask data analysis and verification. The independent CCD camera has a field depth range of 156mm, which can be adjusted to create a high-resolution image of up to 1.98M x 1.98M pixels. It is also equipped with a lens-shift asset that provides optical edge-shift control, enabling the model to correct optical distortions. The advanced beam steering features ensure extreme accuracy of object scanning with 4 axes of control. OPTISTATION-III has a number of customization options available to suit individual user preferences, including a user-selectable exposure setting and UV exposure parameters. This equipment is also capable of controlling the measurement time, so that production efficiency can be improved even further. In addition, NIKON Optistation III has a number of advanced functions to fine-tune the operation of the system, such as the software automatic gain control for noise reduction, as well as advanced data analysis for enhanced visualization of patterns and defects. NIKON OPTISTATION-III is an innovative and versatile unit for advanced wafer and mask inspection. Its combination of sophistication and high-level performance make it ideal for fast and accurate inspection in highly demanding industrial settings. Its flexibility, accuracy and high performance are invaluable for ensuring top-notch quality and precision in production.