Used NIKON Optistation III #293629232 for sale

NIKON Optistation III is a mask & wafer inspection equipment designed to provide high-quality imaging of masks and wafers during semiconductor manufacturing processes. This system uses advanced optics, high-resolution cameras and sophisticated algorithm-based image recognition to rapidly and accurately identify and measure defects in semiconductor mask and wafer layouts. NIKON OPTISTATION-III is equipped with a range of optics, lenses, color filter wheels, and light sources for the illumination of samples. It contains a wafer inspection stage that supports 200 and 300 mm wafer sizes, a flat substrate inspection stage for mask inspections, and a high-speed, high-precision, coarse/fine drive stage unit which increases throughput by 3.5 times or more compared to the Optistation II. The fast stage movement allows for shorter exposure times and faster image processing, resulting in more accurate defect inspection and accuracy appropriate for industrial use. The inspection machine uses NIKON proprietary Edge and Particle technology, which automatically detects differences in contours and sizes between wafer surface features, and to accurately identify particles on masks. A host of image processing algorithms detect edge contrast and false color, digital signal processing, mask level identification (MLI), feature recognition, particle detection and positioning, and other inspection functions. Optistation III also minimizes downtime by optimizing the inspection process and thus increasing the throughput. This tool features SYSTEX-B, a wafer exchange asset that allows the model to exchange multiple specimen units at once, dramatically increasing throughput and efficiency. Likewise, the Mask Exchange Equipment (MES) ensures continuous operation even when an inventory of inspection masks needs to be replenished. OPTISTATION-III is user-friendly and its automated operation systems simplifies the setup and adjustment procedures. NIKON Optistation III also offers protection from environmental elements and adjustments for each system component is available to ensure high quality imaging in all types of light conditions. It is an advanced optical inspection unit applicable for a variety of applications including precision photomask production, mask pattern defect inspection, reticle inspection, and IC wafer defect inspection. This machine sets a high standard of accuracy, flexibility, and speed for a wide variety of mask & wafer inspection requirements.