Used NIKON Optistation VII #293592368 for sale
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ID: 293592368
Wafer defect inspection system, 12"
(2) FOUP Front end load ports
ASYST ISO Port FL300 with mapper and RF ID
ULPA Filtration system
Air suspension vibration isolation table
Standard microscope unit with automated control
Eyepieces: 10x
Objective lens: 2.5x
0.075 W.D. 8.8 mm
10x N.A. 0.300 W.D. 6.50 mm
20x N.A. 0.460 W.D. 3.10 mm
50x N.A. 0.900 W.D 0.42 mm
150x N.A. 0.900 W D.0.29 mm
Halogen lamp house: 12 V, 100 W
Robot controller
Ceramic robot arm
Macro unit A:
Wafer chuck
Macro movable unit
Slider assembly
Macro unit B:
Arched holder
Rotation unit assembly
Micro stage unit
XY Stage / Chuck
XYZ Drive unit
DART Controller: Image archiving and defect review
LCD Display
Keyboard / Trackball
Image capture board:
Integral technologies video card
SONY DXC- 9XX/MD Camera.
NIKON Optistation VII is a flexible, high throughput mask and wafer inspection equipment that provides rapid and automated inspection of both masks and wafers. This system offers superior accuracy in terms of defect detection, with the ability to detect patterns as small as 0.2 to 0.8 microns. It also offers a wide range of versatility for inspecting a variety of different materials, including photomasks, lithographic masks, and wafers. The unit operates using a high speed xenon strobe light source to illuminate the sample, and a CCD camera to capture the image. The imaging machine can detect submicron differences as well as signals well beyond the visible light spectrum, which allows the tool to accurately inspect for defects and sub-micro structures. Its 4K pixel CCD array enables extremely fine inspection resolution, and the asset has powerful magnification capabilities ranging from 5x to 2500x. The model has a large 12x12 inch inspection area, enabling it to cover up to a dense area of the material quickly and non-destructively. Its constant-depth focus assures high accuracy and consistency throughout, so that images are consistently sharp and clear. Additionally, with no human involvement needed, the equipment can perform automated scanning and analysis without interruption. Moreover, Optistation VII comes equipped with advanced software for automated feature inspection. It has a powerful defect detection engine to detect particles, flaws, minute defects, and irregularities. This software is also equipped with powerful programming capabilities, enabling the user to create automated sequences to inspect multiple types of features. NIKON Optistation VII is designed to provide automated, reliable, and high accuracy inspection of both masks and wafers. With a wide range of versatility, advanced software capabilities, and superior accuracy, this is an ideal choice for inspection applications that require a high degree of precision.
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