Used NIKON Optistation VII #293644229 for sale

NIKON Optistation VII is a state-of-the-art Mask & Wafer Inspection equipment designed to meet the high levels of precision necessary for today's advanced semiconductor fabrications. Based on NIKON revolutionary imaging technology, this system can detect even the most elusive defects. Optistation VII integrates several high-end components and offers advanced capabilities to meet the exacting demands of modern mask inspection. Its advanced automatics, brightfield detection methods and imaging technology allow NIKON Optistation VII to identify and locate defects automatically. Through its Image Matching mode, it can provide users with additional information on the shape, size, and nature of detected defects. Optistation VII consists of a modular architecture for scalability and easy maintenance. Its advanced optics unit consists of a high-numerical-aperture (NA) objective lens, a variable source of built-in illumination, and a digital camera with large dynamic range. NIKON Optistation VII ensures a uniform imaging field over a wide, uniform range of sensitivity and contrast. The machine's advanced automated functionality eliminates the need for tedious manual operations. It automatically detects and locates even the most minute defects. Optistation VII's embedded, real-time defect detection algorithms have the ability to detect and review all types of mask related defects. Additionally, its Smoothing option reduces false alarms by eliminating artifacts and noise from the images. NIKON Optistation VII also offers several informative feedback and reporting options. Its comprehensive report option contains a wide selection of features including defective area ratio, defect size and shape, major defect and minor defect detailed lists, as well as a pass/fail report. Additionally, it features a Low Level Lighting Tool (LLGS) for backside defect review and a Live Line Scan for mask overlay analysis. Optistation VII provides users with improved workflow efficiencies, powerful accuracy and reliability, and the scalability needed to meet even the most demanding semiconductor inspection tasks. With its robust capabilities, it will provide users with the means to achieve the highest levels of defect-free mask and wafer inspection.