Used NIKON Optistation VII #9179814 for sale

NIKON Optistation VII is a high-end mask and wafer inspection equipment that is designed to help increase productivity and accuracy in wafer inspection processes. This system utilizes advanced technologies such as an automated high-resolution imaging unit, an high-speed image processing architecture, and advanced algorithms to support higher throughput and improved mask detection. Optistation VII is ideal for production-level mask and wafer inspection needs including optical resolution as low as 0.045 µm. This advanced inspection machine enables a full suite of wafer inspection capabilities for both mask and reticle defects and complements the inspection and pattern-matching process. Utilizing advanced optics and image processing, the tool can inspect 100% of a wafer's area to detect and analyze defects, regardless of size or shape. This helps enable increased quality control and increased yield of additional production. NIKON Optistation VII is capable of using multiple imaging stages, which can be used for in-depth inspection, mask comparison, and the process capability of mask layout and variation analysis. In addition, the asset can also be used for close observation of micro-defects which are not visible on the mask to a human eye. Optistation VII is designed for the fast and accurate analysis of a variety of analog, digital and mixed-signal applications. High-speed image processing architecture and advanced algorithms are integrated into the model to allow for faster and more accurate detection and analysis of faults. This helps to improve the accuracy of some test structures, such as defects like line shorts, line opens, vias, conductive loops, unconnected pads, etc. NIKON Optistation VII also incorporates a user-friendly interface that simplifies operation and process automation. For improved operator accessibility, the equipment utilizes multiple user-defined result display types. These include tabular and graphical results—certainly allowing for more detailed fault analysis and observation for an improved production process and throughput. In conclusion, Optistation VII is a reliable and versatile wafer and mask inspection system that helps to improve productivity and accuracy of wafer inspection processes. With a high-resolution imaging unit, advanced algorithms and image processing architecture, it is able to detect and analyze defects, regardless of size or shape, for improved quality control and increased yields of production.