Used NIKON Optistation VII #9255573 for sale

ID: 9255573
Wafer inspection system.
NIKON Optistation VII is a comprehensive and advanced mask & wafer inspection equipment. It features high brightness image sensors with multiple imaging platforms, making it ideal for various inspection tasks. The system is especially well-suited for precise and accurate identification of minute defects in wafer lithography and mask inspection. The unit incorporates a quad CCD color sensor which is capable of capturing color images with resolutions up to 10 times greater than conventional mask & wafer inspection systems. It also incorporates a built-in DLP projection technology, which provides outstanding brightness, resolution, saturation and dynamic range. The DLP technology also provides unsurpassed uniformity and consistency, resulting in superior image quality over that of conventional systems. Optistation VII also features state-of-the-art optics for clear and sharp imaging. It uses advanced wavefront sensing and correction technology to eliminate optical aberrations. This ensures an ultra-sharp optic machine that is capable of detecting very fine features in both wafer and mask inspection. The tool includes a comprehensive suite of image processing and analysis tools, such as auto-alignment, defect review, pattern matching, and dynamic image enhancement. The image processing and analysis tools can be used to identify and analyze defects in both wafer and mask inspection. In addition, NIKON Optistation VII also includes a number of other advanced features such as auto-focus, 3D stitching, and advanced image processing algorithms. The asset also features an integrated statistics generation capability, which enables a detailed analysis of the results from each inspection run. Optistation VII is an ideal solution for mask and wafer inspection applications, offering superior performance and reliability. It is an effective and efficient model for inspecting and analyzing various components used in wafer and lithography fabrication.
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