Used OCEAN OPTICS NanoCalc-VIS #293768776 for sale
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ID: 293768776
Vintage: 2017
Thin film thickness measurement system
No PC
2017 vintage.
OCEAN OPTICS NanoCalc-VIS is an advanced mask and wafer inspection equipment designed for high-precision characterization of nanostructured surfaces in the visible spectral range. This innovative tool integrates cutting-edge technology to provide accurate and reliable measurements for a wide range of applications in the semiconductor, optics, and photonics industries. At the core of NanoCalc-VIS system is a high-performance spectrophotometer that utilizes a sophisticated optical design to achieve exceptional sensitivity and resolution. With a spectral range spanning from visible wavelengths (400-700 nm), this instrument enables precise characterization of optical properties such as reflectance, transmittance, and absorbance at the nanoscale level. The unit is equipped with a motorized stage that allows for automated scanning of samples, ensuring reproducible measurements across a large area. OCEAN OPTICS NanoCalc-VIS machine is particularly well-suited for mask and wafer inspection applications, where the accurate evaluation of critical dimension parameters is essential for ensuring the quality and performance of integrated circuits and photonic devices. By combining advanced spectroscopic techniques with automated data analysis algorithms, this tool enables rapid assessment of pattern fidelity, line width roughness, and other key parameters that are critical for process control and yield optimization. Key features of NanoCalc-VIS asset include a high-resolution imaging module that enables visualization of nanostructures with sub-micron precision. This feature is particularly valuable for identifying defects, scratches, or contamination on mask blanks and wafers, allowing for rapid troubleshooting and quality assurance in semiconductor manufacturing processes. In addition to its imaging capabilities, OCEAN OPTICS NanoCalc-VIS model offers advanced data analysis tools for extracting key parameters from measured spectra, such as refractive index, thin film thickness, and surface roughness. These parameters are essential for optimizing the performance of optical coatings, photonic devices, and other nanostructured components in a wide range of applications. Furthermore, NanoCalc-VIS equipment is fully compatible with a variety of sample sizes and configurations, making it a versatile tool for research and development as well as production environments. Whether performing inspections on individual mask patterns or full-wafer layouts, this system offers the flexibility and scalability needed to meet the diverse needs of modern semiconductor and optics industries. Overall, OCEAN OPTICS NanoCalc-VIS represents a state-of-the-art solution for mask and wafer inspection, combining advanced spectroscopic capabilities with automated data analysis tools to deliver rapid and accurate characterization of nanostructured surfaces in the visible spectral range. This unit sets a new standard for precision metrology in semiconductor and photonics applications, enabling researchers and engineers to achieve unprecedented levels of accuracy and reliability in their measurements.
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