Used OLYMPUS KIF-201 #9271417 for sale

OLYMPUS KIF-201 is a leading mask and wafer inspection equipment designed for the semiconductor industry. It is designed to meet the highest level of precision requirements for comprehensive topographic survey of 3-dimensional features on mask and wafer surfaces. This system combines advanced laser scanning technology, to generate high-resolution, detailed images of the 3-dimensional features on the mask and wafer with an intuitive user interface to create a powerful and effective workflow for quality control inspections. KIF-201 utilizes a laser-scanning slit that is scanned along a pre-defined pathway across the mask and wafer surface, allowing for extremely high accuracy measurements. The slit is composed of helium-neon laser light and an imaging device with up to 28.2 muW of sensitivity. The laser slit is able to accurately measure distances of up to 210μm and is capable of recording up to 250,000 points along the scanning line. This high resolution allows for detection of even the most intricate structures on the mask and wafer surfaces. OLYMPUS KIF-201 also features non-contact imaging, allowing the unit to scan delicate structures without causing any damage. This is ideal for delicate samples that may be prone to scratching or other physical damage. It also provides a repeatable, reliable process for inspecting delicate mask and wafer surfaces. Additionally, KIF-201 has a unique machine for managing both camera exposure and laser scanning speed, ensuring that every image and measurement is of the highest quality. The imaging platform provided by OLYMPUS KIF-201 also features a powerful user interface, allowing for easy setup and manipulation of the inspection workflows. It is designed with graphical tools for quickly defining pathways and setting the parameters for image capture and measurements. The inspection process is also completely automated, allowing for complete control over the total measurement duration and accuracy of the results. Overall, KIF-201 is a powerful and reliable tool for the semiconductor industry. It provides cutting-edge laser scanning technology and a high resolution imaging platform, ensuring accurate, detailed and repeatable measurements. It also features an intuitive user interface, allowing for fast setup and easy manipulation of the inspection process. Its non-contact imaging also ensures that delicate mask and wafer surfaces can be inspected without risking any damage. All of these features make OLYMPUS KIF-201 an ideal choice for accurate and reliable mask and wafer inspection.