Used OLYMPUS KIF-202 #9271418 for sale

OLYMPUS KIF-202 mask & wafer inspection equipment is an industrialized tool used to ensure high accuracy, repeatability, and reliability in surface quality inspection. This system includes a digital projection microscope (DPM) which accurately examines the features of the wafer. KIF-202 utilizes a brightfield illumination and a high-resolution camera with magnification from 10 to 600xp. OLYMPUS KIF-202 comes equipped with a high-resolution color LCD display and an interactive touchscreen. This interactive touch allows for easy adjustment of the variable parameters while displaying the mask patterns and wafer surfaces. The unit also features a user-replaceable projection lens assembly to easily switch between 5X and 10X views. Additionally, KIF-202 can be operated from a computer or industrial control machine, which further enhances usability. With its automated wafer alignment processing, OLYMPUS KIF-202 is able to accurately measure width, height, and other mask/wafer parameters with resolution down to 1 micron. This tool achieves up to 6x faster throughput, which allows for high-speed, accurate inspection of wafer surfaces. The advanced software incorporated into KIF-202 uses inspection rules and algorithms to compare the wafer surface to a stored template. Automated defect measurements and the ability to store numerous mask/wafer patterns ensures further accuracy and repeatability. In addition, the tool provides visual aid to help identify and classify defects. OLYMPUS KIF-202 also features an industrial-grade design with a dust-protected interior and long-term stability. With the combination of high-precision components and robust mechanics, this inspection asset allows for heavy-duty, continuous operation. The mechanical model also uses a leveling equipment to provide optimal results. Overall, KIF-202 mask & wafer inspection system is an ideal tool for conducting fast, reliable, and accurate inspection of wafer surfaces. With its advanced software and industrial-grade design, OLYMPUS KIF-202 allows for efficient and repeatable measurements with resolutions down to 1 micron. This unit is essential for maintaining the highest quality standards in wafer production.