Used OLYMPUS KIF-202 #9394252 for sale

OLYMPUS KIF-202 is a mask and wafer inspection equipment specifically designed for the semiconductor fabrication industry. It can accurately detect defects and critical parameters on transport masks and free-standing wafers. KIF-202 has multiple functions including the ability to measure film thickness, overlay accuracy, and other wafer properties. OLYMPUS KIF-202 features a high precision 10nm repeatability stage and uses a high power laser to detect extremely small defects. It also has a high-resolution 5 micron CCD camera which enables pattern matching for lithography measurements of overlay accuracy. The system also features a wide range of interchangeable lens, filters, and illuminator options to ensure the best image quality possible for a wide variety of applications. KIF-202 is designed for quick and easy operation, with a user-friendly touch panel and automated procedures. It also has a fully integrated analysis package with built-in statistical capabilities and data archiving. OLYMPUS KIF-202 features high speed image inspection and yield analysis to ensure the highest yield and throughput levels in the industry. KIF-202 is also an environmentally friendly unit, as it has very low energy consumption and supports a range of green technology solutions. The machine's advanced automation features also reduce the need for hand-crafted solutions, which saves time and money. Additionally, the tool is designed for easy maintenance, allowing for increased uptime and fewer maintenance costs. Overall, OLYMPUS KIF-202 is an advanced mask and wafer inspection asset that helps semiconductor manufacturers achieve the tight tolerances and high yields necessary for success in their operations. The model is designed for reliable operation, long lifespan, and easy maintenance. With its robust set of features and low energy consumption, KIF-202 is a great solution for mask and wafer inspections.