Used OLYMPUS MHL 525 #9195386 for sale

OLYMPUS MHL 525 is a mask and wafer inspection system characterized by its ability to quickly and accurately inspect semiconductor wafers and masks. This system utilizes advanced imaging technology to detect subtle differences in surface features at a very high resolution of up to 5000x. It has been designed to inspect patterns on various base substrates, including wafer surfaces, with maximum accuracy. OLYMPUS MHL-525 utilizes a pattern recognition software engine which can detect surfaces down to 0.6 micrometers in feature size. It can scan large wafer surfaces up to 300mm in diameter in one single inspection cycle. It also features high-precision optical sensors in order to detect very slight fluctuations in surface features. For instance, it can detect any single missing or abnormally displaced element. MHL 525 is capable of both direct imaging as well as direct wafer mapping. Direct imaging allows for inspection of the substrate from any angle or viewpoint. Direct wafer mapping allows for more accurate inspection as it enables collection of detailed metrology data. The main components of MHL-525 include a wide field of view stereo microscope, a high-definition LCD monitor, an LED source, a particle recognition software engine, and a Gigabit Ethernet connection. The LCD monitor allows users to view the inspected objects in real-time and the LED source illuminates the substrate for optimum image contrast. The particle recognition software engine can detect localized defects in both semiconductor wafers and masks. This software can recognize defects as small as 0.2 μm along with other kinds of miniscule irregularities. The software runs on a powerful image processing hardware platform which also includes a 16-bit A/D board and a PCI bus. OLYMPUS MHL 525 supports many resolution and speed settings, in order to perform varied inspections. It allows users to set and adjust the speed, shape, and size of inspected objects. Furthermore, it enables users to change the intensity of various components in order to get better resolution and contrast on the object. Overall, OLYMPUS MHL-525 is a highly efficient and reliable mask and wafer inspection system. Its state-of-the-art optical technology, advanced software algorithms, and powerful hardware platform make it the perfect choice for complex mask and wafer inspection tasks.