Used OSI Metra 2100M #9026268 for sale

OSI Metra 2100M Mask & Wafer Inspection Equipment provides a powerful inspection, analytics, and defect review platform with highly accurate results for semiconductor mask and wafer fabrication. This tool is uniquely designed to give users the needed power to quickly and accurately analyze large wafer and/or mask data sets. This tool can rapidly scan mask and wafers at previously unattainable speeds. Built to accommodate images with up to 2-micrometer resolution, Metra 2100M can scan an entire 13-inch wafer in only 90 seconds. That unique optimization, paired with its incredibly high-resolution algorithms, ensures both rapid and accurate results. The system is also designed to reduce the reject rate of wafers, as well as remove false defects from the inspection data set. When it comes to deep analytics, OSI Metra 2100M offers numerous user-selectable pass/fail criteria to ensure accuracy. Grayscale analysis, for example, uses pixel-by-pixel comparison techniques to precisely measure image details. Additionally, the unit offers grainy analysis and sophisticated applications for Binary, Line, Fill, Density, Contrast, and Transparency analysis. These can be used to note the most slight differences between masks and wafers, helping identify and remove various types of defects. The machine also includes powerful post-inspection defect review and optimization tools. Here, the user has a range of options, including automatic defect classification, defect data visualization, and auto-classification of various defect types. The tool is also designed to provide users with built-in defect databases, allowing users to further shorten their inspection times as well as offer improved detection and rejection of defects. When it comes to user-comfort and efficiency, Metra 2100M offers advanced temperature control and a powerful file format manager. This allows users to store and compare different images and to manage large data sets in an organized and efficient manner. Overall, OSI Metra 2100M Mask & Wafer Inspection Asset provides users with reliable, accurate, and easy-to- understand results. Its optimization of image resolution, advanced analytics, and defect review and optimization tools make it an ideal choice for semiconductor mask and wafer fabrication.