Used OSI METRA 2150M #293811508 for sale

OSI Metra 2150M is a high-performance mask and wafer inspection equipment that combines automated optical and laser measurement solutions to meet the requirements of both semiconductor mask and wafer inspection. The system is designed to detect, classify, and measure a wide variety of defects on both optical and laser processed masks and wafers. Metra 2150M is equipped with a high powered laser module and a suite of patented optical detection, classification, and measurement algorithms. The laser module consists of three interchangeable laser sources: a high power laser, a near-infrared laser, and an ultraviolet laser. The unit has a sensor resolution of one micron and a measurement range of up to 300 mm. One of the key features of OSI Metra 2150M is its modular and scalable architecture, which allows it to be deployed in various applications such as semiconductor mask, component, and wafer inspection. The machine's high-speed inspection capabilities, combined with its ability to detect different types of defects, provide the most reliable and cost-effective solution for mask and wafer inspection. Metra 2150M can be programmed to detect various types of defects such as scratches, pitting, breaks, coating problems, pinholes, critical feature size, line width measurement, and others. It can also be used for surface inspection and for processes such as pad-over-pad inspection and grid-to-inspection. OSI Metra 2150M is designed with user-friendly software, which enables users to easily import and export data, as well as to monitor and control the tool. The software also provides customizable reports and diagrams, which enable users to track their inspection results and analyze the data. Additionally, the sophisticated optical and laser inspection capabilities of Metra 2150M allow users to detect even the most minute defects on both mask and wafer surfaces. OSI Metra 2150M is a reliable and cost-effective mask and wafer inspection asset that is designed to detect and measure a wide variety of defects. Its high-speed inspection capabilities, modular and scalable architecture, user-friendly software, and sophisticated optical and laser inspection capabilities make it the perfect choice for any mask and wafer inspection application.