Used OSI Metra 2200M #9384889 for sale

OSI Metra 2200M is a mask and wafer inspection equipment designed to provide fast, accurate inspection of wafers and masks used in semiconductor manufacturing. The system uses an advanced, high-resolution imaging unit to analyze every image on the wafer or mask in a matter of seconds. The machine's ability to identify errors and defects in a very short amount of time makes it ideal for production-level manufacturing. Metra 2200M is built using two main components, a sensor/itcore processor and optics array. The sensor/itcore processor acts as the eyes of the tool and reads every image on the wafer or mask. The optics array captures the images at 800-1000x magnification and applies algorithms to analyze the results. This gives OSI Metra 2200M the ability to detect errors and defects. Metra 2200M utilizes a variety of software tools to provide results. These include advanced pattern recognition, defect review, and process control features. The pattern recognition feature identifies anomalies and abnormal patterns in the images, while the defect review feature checks for contamination, misalignment, and other undesired conditions. Finally, the process control feature helps streamline production by monitoring the process and providing feedback on any adjustment that needs to be made. Overall, OSI Metra 2200M is a powerful and efficient mask and wafer inspection asset. Its ability to quickly and accurately detect defects in a production setting makes it an indispensable tool for semiconductor manufacturers. The model's advanced features make it able to identify issues quickly and conveniently, while its high-resolution imaging provides detailed images of any defects. In addition, the equipment's process control feature helps manufacturers streamline their production. As such, Metra 2200M is an effective and reliable device for semiconductor manufacturers.