Used OSI VLS-1 #176092 for sale

OSI VLS-1 is a fully automated top-down (brightfield) in-line mask and wafer inspection equipment designed for demanding semiconductor applications. The system is capable of measuring the critical optical parameters of lithographic masks such as defect detection, opacity, reflectivity and contrast. In addition, it is able to detect non-lithographic defects such as contamination, micro-cracks and other defects on the wafer surface. VLS-1 inspects both the mask and the wafer, using brightfield and darkfield illumination techniques. It is equipped with an advanced 8-axis, high-resolution XY-Motor unit that allows the mask to be precisely positioned with micron-accuracy. The machine also features an integrated magnifier and a laser scanning microscope that can inspect up to 256x256 micron area at a depth of field up to 90 microns. The high-speed, high-performance CCD camera enables the tool to detect defects down to 0.1 micron in size with very high sensitivity. OSI VLS-1 software is designed for both process control and stand-alone operator control. It is integrated with a database asset that allows users to configure parameters and save results. The software interface is user-friendly and intuitive, allowing for quick and easy setup and analysis of data. VLS-1 offers the unmatched level of accuracy and sensitivity necessary for critical mask and wafer production requirements. Its intuitive, easy-to-use interface enables fast access to results, giving maximum flexibility for process control and optimization. Finally, OSI VLS-1 offers users a cost-efficient solution for improving product yield, increasing throughput and reducing costs associated with mask and wafer inspections.