Used OSI VLS-1 #40614 for sale

OSI VLS-1 is an advanced mask and wafer inspection equipment used in the semiconductor manufacturing process to detect defects in the lithography process. The inspection system uses sophisticated optical techniques with high-resolution imaging scans to detect micro- and sub-micron sized irregularities on the surface of silicon wafers and photomasks used in the lithography process. The core of VLS-1 unit is a large optical microscope with maximum magnification capability of five-hundredfold. This allows for precise imaging to detect the smallest of irregularities on the surfaces of both wafer and mask. To ensure accuracy, the microscope is further equipped with a multi-LED illumination machine for optimal light and shadow contrast, along with a digital distance delineator for precise measurement on imaging specs. The imaging tool also includes an automated pattern recognition asset, allowing the microscope to depict a "fingerprint" of the pattern layer, and an automated defect detection model that can identify any irregularities that may affect production quality. With these systems in place, the equipment is able to rapidly identify defects that may exist on the surface, and provide rapid feedback on the problem. OSI VLS-1 is not limited to imaging, as it also includes a comprehensive suite of nondestructive testing (NDT) options. The system features an Electro-Magnetic Induction (EMI) feature, which tests for shorts, over-currents, and other abnormalities that may result from improper photoresist processing. Additionally, the unit can also utilize an Acoustic Impedance Mode (AIM) and an Auto-Sampler mode (ASM) to further analyze wafers and masks at an atomic level. The entire machine is protected and monitored by an advanced software solution, called ProVS. This fully integrated package controls the imaging tool operation, provides real-time performance, and enables remote data access and management. Additionally, the software can also generate custom reports, as well as a summary of the inspection results. Overall, VLS-1 mask and wafer inspection asset uses highly advanced optical techniques and NDT options to detect any irregularities that could potentially impact the quality of lithography processes. This model has proven to be a valuable asset to the semiconductor industry, and is trusted by global brands in this sector.