Used SAVVY OPTICS CORP SIF-4 #9173276 for sale

SAVVY OPTICS CORP SIF-4 (surface inspection equipment) is an optical inspection machine designed for mask and wafer pattern inspection. SIF-4 offers excellent recognition accuracy by using advanced optics and high-speed image processing. It features a high-resolution, non-invasive 3D surface inspection system combined with an intuitive user interface for easy operation. SAVVY OPTICS CORP SIF-4 incorporates an advanced optical unit with a 5-megapixel detector with a high dynamic range and low noise. The machine uses light reflection technology providing a wide field of view and precise surface measurement. The optics of SIF-4 are advanced with a highly sensitive zoom lens and wide field of view. Additionally, the tool offers high-speed and accurate pattern recognition, enabling wafer and mask alignment and inspection. SAVVY OPTICS CORP SIF-4 has a high-resolution image acquisition, allowing users to quickly and accurately measure various geometrical parameters of a pattern. Furthermore, the asset also features an advanced image processing package, which allows users to adjust the image contrast, granularity, saturation, and gain. This helps the model to resolve small feature resolutions or detect slight color variations. The user interface of SIF-4 is designed to be intuitive and easy to use, enabling users to customize their settings quickly. Additionally, the equipment can be programmed with a variety of automatic functions for increased accuracy, including pattern search, defect detection, and color inspection. The system also includes an auto-focus function, which enables it to quickly adjust for changing focal depths. In addition, the unit features advanced software for data analysis and reporting. This software provides detailed information about the inspected pattern, including individual pattern elements and difference images. This data can help to identify the cause of any defects or abnormal patterns. Overall, SAVVY OPTICS CORP SIF-4 is an advanced optical inspection machine designed for mask and wafer pattern inspection. It has a high resolution image acquisition and an intuitive user interface, combined with advanced optics and image processing technologies. This machine is designed to provide accurate and fast results, enabling users to quickly and accurately measure various geometrical parameters of a pattern, detect slight color variations, resolve small feature resolutions, and identify potential defects.