Used SDI CMS III-AR #9152693 for sale

ID: 9152693
Contamination monitor system Vacuum: 500 Torr or less Cybeq 2830 Pre aligner Single phase, 50/60 Hz, 110 V Currently warehoused.
SDI CMS III-AR is a state-of-the-art mask & wafer inspection equipment featuring advanced imaging, analysis, and reporting capabilities. It utilizes the average vector difference (AVD) algorithm, an advanced inspection algorithm based on several different imaging techniques to rapidly detect and locate defects on masks and wafers. The system features a top-down laser projection module that operates at 5µm resolution, on mask or wafer samples of up to 300mm in diameter. The imaging components of the equipment provide enhanced accuracy and resolution to detect subtle defects such as line width variations or bridging. The versatile analysis tools can both detect and correct defects. Mask and wafer profile and overlay registration, automated defect shape analysis, and defect-seed analysis are all built-in capabilities. The stage on the unit is capable of handling heavy loads, and can be used for large area imaging. It also incorporates a high-resolution encoder for superior stage positioning accuracy. Many configurations are available, featuring up to three cameras for RGB imaging or multi-beam laser light sources for greater accuracy. A computer-controlled optical machine calibrates the beams and cameras for optimal imaging and measurement performance. The tool's software offers a sophisticated graphical user interface, capable of comparing and synchronizing multiple images and graphs. It also supports a wide range of formats for data exchange and storage. Image analysis and reporting functions are highly customizable, featuring customizable sources and modular analysis tools. Advanced reporting capabilities enable quick and easy data output for all types of defect detection and measurements. CMS III-AR is a highly versatile asset, suitable for a range of production environments. Its unique feature-set provides a cost-effective way to increase yield in today's advanced production environments. With its advanced capabilities, it guarantees optimum process performance and ensures excellent product quality.
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