Used SEMILAB / SDI FAaSt 350 #9236853 for sale

SEMILAB / SDI FAaSt 350 is an automated mask and wafer inspection equipment that uses advanced microscopy and optical imaging techniques to detect defects and variations in IC fabrication. The system is capable of inspecting lithography masks, wafers and reticles with resolutions up to a sub-micron. It is suitable for a broad range of applications, including polishing masks and wafers, as well as high-accuracy measurement and analysis of pattern-matching and dimensional characteristics. The unit consists of a computer control unit and digital imaging machine, with a movable stage that can accommodate specimens up to 350 mm in diameter. The imaging tool includes advanced optical techniques such as green laser interferometry and red-green-blue laser imaging. This allows for non-invasive inspection of mask and wafer materials, and accurate 3D surface analysis. The asset is also equipped with a confocal microscope, enabling automated detection and measurement of micro- and nano-scale features. For measuring patterns, SDI FAaSt 350 also includes an optical interferometer for high-precision pattern measurement, capable of detecting approximately 40 nm width or height variations with a resolution down to 10 nm. Additionally, the model is able to measure other dimensional characteristics with a high degree of accuracy and speed. SEMILAB FAaSt 350 is integrated with SDI SP3D inspection software, enabling fast and efficient defect characterization. The equipment is also compatible with several pattern matching algorithms and a range of optical microscopy analysis protocols, allowing for efficient automation of processes. Furthermore, the system can be used for defect repair and mask-making processes, and includes a secure, highly efficient, and user-friendly interface that can be merged with CAD, SEM and PLM tools. In conclusion, FAaSt 350 is an advanced and reliable mask and wafer inspection unit that is capable of detecting fine defects and variations using advanced optical imaging techniques. The machine is suitable for both mask and wafer inspection, and can be versatilely used for a range of metrology and inspection processes. The SP3D inspection software and high-precision pattern measurement capabilities make this tool an ideal solution for scanning, inspection and analysis of mask and wafers.