Used SEMILAB / SDI FAaSt 350 #9236891 for sale

SEMILAB / SDI FAaSt 350 is a specialist instrument designed to inspect masks and wafers in the semiconductor industry. The equipment is comprised of an advanced optical microscope configured with a frame grabber, digital or analog camera, image processing software, and a pattern recognition module. It is ideal for smaller imaging applications, such as wafer die, circuit pattern or reticles. The system is designed to detect even the smallest irregularities, allowing for early detection of problems within the semiconductor device that would otherwise be too small to be noticed. It can examine every region of the wafer or element to ensure its uniformity. SDI FAaSt 350 is equipped with a full-field illumination unit and Object-Centred Microscopy (OCM). This illuminating machine creates a very bright, uniform light, which is directed and revealed onto the sample through focusing the light onto various portions to be studied. This enables the tool to take advantage of submicron features, which can be difficult to detect with traditional means. With the use of a 3D image processing asset, the model can detect and measure features with incredible precision. It utilises a geometric analysis method to allow a three-dimensional view of the mask or wafer, allowing multiple feature dimensions to be monitored in a single operation. This flexibility makes SEMILAB FAaSt 350 a highly versatile instrument, and it can be used for various inspection tasks from simple defect analysis to complex profile measurements, all in a single data set. The equipment is conveniently configured with full touchscreen controlled operation, allowing operators to work efficiently and accurately. It also features a wide variety of advanced illumination options such as Planar, point guard, Line Guard, Contrast analysis, Multi-Channel Contrasts, Messaging and high speed operation. It can be easily programed to accurately and quickly capture images and results. Overall, FAaSt 350 is an advanced mask and wafer inspection system that provides high-resolution analysis, object-based viewing and fast, accurate results. It can be tailored to different inspection tasks and environments and is a reliable, efficient unit for ensuring the highest levels of quality control in semiconductor production.