Used SEMILAB / SDI WT-2000 #9259516 for sale

SEMILAB / SDI WT-2000 is a mask and wafer inspection equipment built with the goal of providing inspection capabilities for lithography and metrology applications. It is designed for inspecting, sampling, and measuring wafers and masks with high accuracy and repeatability. This system features a dual-head optical unit, a proprietary control machine, and advanced proprietary image analysis software. The mask and wafer inspection tool is equipped with a 1k x 1k CCD camera and dual-head lighting control that ensures uniform illumination of the wafer and mask surface. The asset is capable of inspecting the entire wafer in one pass with a high degree of precision. Additionally, the model works in a pulse lighting state to compensate for the small differences in surface topography, thus producing consistent results for the entire wafer. The advanced image analysis software allows for the detection of defects, such as critical dimension and exposure errors, while detecting variations in the wafer structure. It combines full wafer analysis with isolated critical area analysis, thus ensuring exhaustive inspection for defects. Additionally, the high-end automated defect detection equipment enables the system to detect subtle and isolated wafer defects that are otherwise difficult to identify. The proprietary control unit enables the operator to control the camera, lighting, stage position, and optical machine in a single, unified hardware. It also allows for the integration with external statistical process control and data acquisition systems, thus allowing for the quick analysis of wafer and mask data. Additionally, the tool can integrate with wafer trackers, ensuring precise tracking of the wafer as it moves through the machine. In summary, SDI WT-2000 is a complete, high-precision mask and wafer inspection asset. It is designed for inspecting, sampling, and measuring wafers and masks with accuracy and repeatability, while its advanced image analysis software and proprietary control model provide seamless integration with external statistical process control and data acquisition systems. Additionally, the equipment works in a pulse lighting state to compensate for the small differences in surface topography, ensuring consistent, repeatable results for the entire wafer.