Used SEMITEST Epimet II #9104044 for sale

SEMITEST Epimet II is a cutting-edge mask and wafer inspection equipment developed by SEMITEST Corporation. This revolutionary new system is designed to provide the highest levels of speed, accuracy, and sensitivity in its sector. The unit uses an optically-coupled signal acquisition machine to ensure significant levels of optical clarity. This allows Epimet II to inspect a variety of masks and wafers of all shapes, sizes, and thicknesses with superior speed and precision. With the tool's deep focus optics, laser-sharp resolution is achievable, even at higher magnifications. The advanced image analysis algorithms employed in the asset provide the user with detailed images and insights into mask and wafer defects. This enables micro-level analysis of defects, compared to conventional methods, with excellent accuracy. The output of this analysis can be exported in several formats for further analysis, if desired. SEMITEST Epimet II is also capable of scanning large areas of masks and wafers at high speeds. This means that the model can rapidly inspect large areas and check for any issues such as contaminants, cracks, and other damage. The scan and analysis process can be automated, providing a completely streamlined equipment with a minimum of user input. The system is also populated with automatic failure detection and alerting systems, ensuring exceptions are quickly identified and flagged. This means any potential issues can be quickly identified, leading to improved process efficiency and reliability. Overall, Epimet II is a highly advanced and powerful mask and wafer inspection unit. Its range of features and capabilities provide the user with unparalleled levels of speed, accuracy, and reliability, making it an excellent choice for any laboratory or production environment requiring high levels of precision analysis.