Used SEMITEST Epimet II #9105435 for sale

SEMITEST Epimet II is a mask and wafer inspection equipment designed for multi-level analysis of all types of lithography patterns. This system includes advanced optical configuration options and provides high resolution imaging and algorithmic feature recognition. The main components of Epimet II are the optical microscope and a control unit. The optical microscope captures images of the patterned sample using laser illumination and collects them in a digital format. The objective lenses offered by the unit allow for different degrees of magnification to assess the patterns with higher detail. The control unit is used to analyze the pattern images. It contains high-speed processing, advanced algorithmic recognition features, and is capable of providing real-time analysis. The control unit can be used to compare the patterns with reference images, measure features such as line width and the pitch between lines, detect defects, and identify potential yield issues. In addition to image analysis, SEMITEST Epimet II can be used for automated wafer testing. The machine can be equipped with contact and non-contact sensors, such as spectroscopic ellipsometers, to measure electrical and optical properties of the wafer. This allows for testing during the production process to identify any potential problems before completion. Epimet II provides an accurate, fast, and reliable mask and wafer inspection tool. It offers a highly automated process for detecting potential defects and yield issues in patterned wafers. The asset allows for multi-level analysis of the patterned sample and provides detailed feedback on the features and properties of the sample for an accurate assessment.