Used SEMITEST Epimet II #9193399 for sale

SEMITEST Epimet II is a powerful, automated mask and wafer inspection system designed to quickly and accurately identify both defects in semiconductor masks and wafers. By incorporating sophisticated image processing algorithms with multi-wavelength brightfield and darkfield imaging, Epimet II provides a detailed, high-resolution inspection of these critical elements. SEMITEST Epimet II utilizes a high-definition imaging sensor attached to a precision robotic arm, which is capable of scanning the entire mask and wafer surface. The imaging sensor picks up brightfield and darkfield data in visible, near-infrared, and deep-UV spectrums. The automated arm is then run across a specimen, allowing the system to capture thousands of angular views of the specimen at multiple resolutions. Overall, Epimet II provides superior image clarity and contrast for accurate defect identification. The data collected is immediately analyzed for defect levels - including scratches, voids, and contaminants - and detailed results are provided within seconds. The user-friendly system interface allows for the inspection of all masks and wafers simultaneously across a production line, and alerts operators of any potential defects that may occur. SEMITEST Epimet II is a powerful tool for semiconductor fabricators, capable of significantly reducing production times while providing high-accuracy inspection for every mask and wafer. By utilizing the latest image analysis technology, Epimet II allows for the automatic identification of defects in a fraction of the time required by manual processes. With its user-friendly interface and quick analysis times, SEMITEST Epimet II ensures that every mask and wafer is well prepared for production.