Used SONIX CSAM UHR 2001 #100833 for sale

SONIX CSAM UHR 2001 is an advanced, high-performance mask and wafer inspection equipment. It is designed to perform accurate and precise automated defect resolution and analysis of semiconductor wafers and masks, creating higher yields in the production of complex semiconductor devices. CSAM UHR 2001 utilizes a high-resolution optical system, which is capable of detecting a wide range of defects of various sizes, shapes, forms, and locations. Its automated defect resolution and analysis capabilities allow end-user to quickly and accurately identify defects and potential process issues, eliminating time and guesswork. This makes SONIX CSAM UHR 2001 the ideal unit for the rigorous inspection of semiconductor wafers and masks. At the heart of CSAM UHR 2001 is its high-resolution optical machine, comprised of several components including a multi-wavelength illumination source, optical relays and focusing elements, image capture systems, and a programmable defect analysis processor. The tool uses a variety of sophisticated optics, charge-coupled devices, and image processing algorithms to detect subtle changes in scattering and reflectance properties at different stages of the image capture process. These data are then processed and displayed to give a detailed view of the defects. The asset is designed to be user-friendly, eliminating any need for operator training. Its intuitive touch-screen interface makes it easy for the operator to make adjustments to the inspection parameters, customize the output displays, and control the image capture model. It also offers a range of different imaging modes, including bright field and dark field, spectrum phased array, side-view imaging, and 3D imaging. SONIX CSAM UHR 2001 is one of the most advanced systems available for the inspection and analysis of mask and wafer defects. Its high-resolution optical equipment, combined with its user-friendly controls, makes it an ideal inspection solution for semiconductor manufacturers. Its efficient and accurate analysis capabilities significantly reduce production costs, time, and complexity, making it the perfect system for the rigorous inspection of semiconductor masks and wafers.