Used SVG / PERKIN ELMER / BSL OS 2000 #9162533 for sale

SVG / PERKIN ELMER / BSL OS 2000 is a mask & wafer inspection equipment designed for industrial use. This system performs various optical measurements, such as feature and mask defect identification, quality control and production monitoring, and more. The unit is composed of several components, including a microscope and digital camera, a computer interface, a spectral translation stage, and a light source. The microscope of the machine is designed to provide a high-resolution, high-contrast image of the wafer or mask. It is equipped with a digital camera, which is used to capture images of the wafer or mask and store them on the computer. With the microscope, small defects and features can be accurately detected. The spectral translation stage provides movement so that the entire wafer or mask can be inspected. This allows for more accurate inspection of large areas and better comparison of different images. The light source illuminates the wafers and masks during analysis, enabling high contrast images to be obtained. The computer interface enables data to be imported into SVG OS 2000 before analysis. This permits image comparison and automatic defect detection and classification. The software is loaded with various tools to help in the process, such as histograms for comparing multiple images, automated defect detection algorithms, and various other tools for analysis. With this software, accuracy and speed are ensured. Finally, the tool can be connected to a variety of other SVG instruments for additional functionality. These include FIBs (focused ion beam microscopes), CVD/PVD systems (chemical vapor and physical vapor deposition systems), and cleaning tools. All of these can be used to ensure a uniform surface and to detect any defects that may be present on the wafer or mask. BSL OS 2000 is a comprehensive asset for performing high-resolution mask and wafer inspections. It is very easy to use and can be adapted to suit many different industrial and research requirements. With its powerful microscope, light source, spectral translation stage, digital camera and software, this model is capable of detecting a multitude of defects and features quickly and accurately.