Used TAYLOR HOBSON PGI 840 #9412072 for sale

TAYLOR HOBSON PGI 840 mask and wafer inspection equipment is an ultra-precise inspection and mapping system designed specifically for mask and wafer inspection. Its enhanced inspection capability offers superior resolution and precision not attainable with other instruments. Additionally, PGI 840 has industry-leading detection capabilities to ensure any errors are quickly identified and mitigated. The combination of specialized optics and galvanometer-based multi-axis scanning ensure the highest precision and accuracy throughout the measuring process. Additionally, its advanced software provides the user with high speed scanning, rapid data capture, and high degree of precision for detecting even the smallest anomalies. The unit includes a variety of scopes and probes to fit application-specific requirements such as retro-reflective (Schmidt-type) and incident light collection, high-water-contact probes, laser beams, and other optics. Sensors use a unique optical design to scan small distances to detect and measure subtle changes in substrate topography. TAYLOR HOBSON PGI 840 uses the latest digital technology for data processing and analysis. By combining image processing and digital signal processing algorithms, the machine is able to accurately detect features such as disequalities, depths, and roughness. Additionally, the tool can be designed to measure a wide range of substrate parameters and map them with high accuracy and consistency. PGI 840 is designed to reduce defect rates and improve yield rates. It provides an unparalleled level of accuracy required for mask and wafer inspection, along with fast data processing protocols and a customizable user-friendly interface. Its powerful inspection capabilities, automated operation, and comprehensive data analysis capabilities allow it to be used in a variety of applications such as chip fabricating, circuitboard testing, and semiconductor manufacturing. TAYLOR HOBSON PGI 840 is a highly versatile asset that is useful for mask and wafer inspection. It offers superior resolution, enhanced detection capability, and advanced software for quick scanning, rapid data capture, and aggressive substrate parameter measurement. The model also has powerful digital image processing algorithms for detecting subtle changes in substrate topography and measuring a variety of parameters with high accuracy and consistency. All of these components, when combined, result in a reliable equipment highly suitable for mask and wafer inspection.