Used TKK MAC-92MV1 #9227386 for sale

TKK MAC-92MV1 is an advanced mask and wafer inspection equipment designed for use in semiconductor production. It is capable of producing wafer-level measurements with a maximum lateral resolution of 0.08 micron and supports a wide range of imaging modes, including high-resolution, dark field, bright field and RGB. The system is equipped with an Automated Image Registration capability which can capture and align images based on the placement of mask features, giving high accuracy and repeatability to the inspection process. This unit also has available a threshold-sensitivity feature, allowing users to control levels of pattern recognition and reaction. MAC-92MV1 is equipped with advanced optics and digital signal processing. Its Nikkor lenses, digital cameras and linear CCD sensor provide an imaging resolution of 4.8um with unmatched sensitivity, clarity and accuracy. The machine uses advanced image processing algorithms to identify and analyze features for defect detection and classification. The user-friendly touchscreen graphical interface simplifies operation, and provides users with a wide range of measurement and display functionality. The tool can store inspection results, feature images and digital images of reticles, allowing users to quickly review and react to any detected defects. The asset is also suited for dual-layer inspection with the ability to select elements from the top or bottom layer. TKK MAC-92MV1 provides more capabilities than traditional wafer inspection systems. It is engineered to handle complex defects such as wire-bridges and particle contamination, and provides a comprehensive platform to support each stage of the photomask production process. This model allows operators to instantly monitor the quality of a mask production process and can be used to reduce labor costs and minimize down-time.