Used TKK MAC-92MV1 #9375007 for sale

TKK MAC-92MV1 is one of the latest in mask and wafer inspection systems available on the market today. This equipment is highly advanced and provides a variety of inspection capabilities and features. The system is built around a mask and wafer inspection camera with its own dedicated optical unit which is designed for use in a wide range of semiconductor inspections. The camera features a color image sensor matrix of 2048 x 2048 pixels, a minimum magnification of 63x, a 6 segment rotatable field of view, and a 2.5MP image fidelity. The machine is also equipped with a CCD imaging tool which consists of a three-channel display, reference, and analysis of wafer features and defects. This allows the asset to detect and analyze many types of defects down to 0.5um pitch. It also offers an auto-thresholding model which allows for fast and automatic scanning of wafer features and defects without tedious operator intervention. MAC-92MV1 can also be configured with multiple surface, edge, or pattern measurement algorithms. This allows for quick and accurate measurements of various surface features, particles, haze, edge roughness, and pattern widths. Additionally, it offers multiple types of automated analysis and measurement capabilities. Furthermore, the equipment is built with multiple image analysis features which allow operators to quickly and accurately inspect wafers and masks for defects and irregularities. These features are designed to provide quick and reliable results in a variety of inspection environments. TKK MAC-92MV1 is a highly advanced mask and wafer inspection system which is designed to provide reliable, accurate results in multiple industry applications. It offers unparalleled image and defect analysis capabilities as well as auto-thresholding and automated analysis processes. Its wide range of features makes it an ideal choice for any mask or wafer inspection needs.