Used TKK MAC-92MV1 #9375008 for sale

TKK MAC-92MV1
ID: 9375008
Overlay measurement systems.
TKK MAC-92MV1 is an advanced mask and wafer inspection equipment designed for high-precision measurements. It is capable of inspecting wafers with a minimum size of 3 microns and a maximum size of 6 inches in diameter. The system utilizes a variety of advanced imaging technologies, including charge-coupled devices (CCDs), special optical components, and an optical microscope. MAC-92MV1 offers multiple imaging modes including brightfield mode, darkfield mode, and reflection mode, allowing users to obtain the highest levels of image resolution, contrast, and depth of field. By combining cutting-edge image processing algorithms with advanced optics, the unit can capture high-quality images of different semiconductor structures with a high degree of accuracy and repeatability. The machine includes an optical microscope, photo-lithography software, computer control panel, and an automated inspection stage. The microscope uses image intensification techniques to enhance the image of very small objects and allow for more detailed imaging. The photo-lithography software allows the user to create custom photomasks that can be printed directly onto the wafer. The computer control panel provides a simplified interface for controlling the trajectory of the wafer during the inspection. And, the automated inspection stage allows precise and accurate measurements of both large and small features on the wafer. TKK MAC-92MV1 also includes a built-in feature recognition tool and a Fourier transform image processor. The former can identify features on the wafer according to specific criteria based on rules set by the user. The Fourier transform image processor enhances image resolution to provide more accurate results. Overall, MAC-92MV1 is an advanced and robust mask and wafer inspection asset that provides exceptional accuracy and repeatability. With its multiple imaging modes, powerful image processing algorithms, and automated inspection stage, the model can accurately and reliably measure semiconductor features with extreme accuracy for the most advanced applications.
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