Used TOKYO AIRCRAFT MEASUREMENT MAC-92 #293587749 for sale

TOKYO AIRCRAFT MEASUREMENT MAC-92 (T.A.M. MAC-92) is a mask and wafer inspection equipment designed to meet the stringent photomask and wafer critical dimension (CD) measurements and inspection requirements required for semiconductor fabrication. The T.A.M. TOKYO AIRCRAFT MEASUREMENT MAC-92 is a high-speed, high-accuracy, non-contact scanning microscope that is capable of providing resolution down to the micron-scale level. It uses a bright field imaging system combining field-emission scanning electron microscopy (FESEM) and laser confocal microscopy, allowing for fast, accurate measurement and inspection of patterned samples. The unit can be configured with several options to improve its performance and accuracy, including the use of a high-sensitivity 4-channel detector with a variable scan size and scan speed. The detector also includes a special high-sensitivity function, which ensures accurate measurement of small-scale patterns. Additionally, the machine includes two-channel laser interferometer microdisplacement stages which enable high-accuracy stage motion with minimal displacement. The T.A.M. MAC-92 offers advanced pattern inspection capabilities for defect miniature mask defects or wafer semiconductor layers. A pattern inspector option is available which permits the definition of up to four custom defect types. Additionally, the tool can analyze patterns from a variety of mask layers using either optical or electron beam imaging. The asset also offers advanced mask and wafer fault detection capability for a variety of superficial and ultra-low-k layers. The model is designed to be user-friendly and easy to operate. It features a touch-screen panel with a graphical user interface (GUI) which displays all key parameters and settings, helping ensure efficient operation and maintenance. An automated calibration process is built-in to the equipment to ensure system accuracy. The T.A.M. TOKYO AIRCRAFT MEASUREMENT MAC-92 is the perfect choice for high-precision mask and wafer inspection. It is capable of accurate, repeatable, and fast measurements at the micron-scale, and provides the most reliable and reliable means of ensuring precision and quality in semiconductor fabrication.