Used TOPCON Vi-SW200C #293607035 for sale

TOPCON Vi-SW200C is a mask and wafer inspection equipment designed to provide high-sensitivity, high-resolution defect inspection from the perspective of a mask mark and etching process. The system features a unique imaging and detection technology that enables it to inspect large semiconductor masks and wafers at the µm and sub µm level. Its ultra-high performance provides fast, accurate, and reliable imaging, detection, and analysis capabilities. Vi-SW200C utilizes a Multi-Beam Iris unit to collect and process data, allowing it to inspect any kind of defect or foreign material on the surface of a semiconductor device. The machine has a unique image filtering and post-processing technology that eliminates false detections and aids in accurate polarity investigation. It also features an interferometer-based wavelength scale measurement tool which enables precise automatic action control and alignment. The asset can accurately detect both defect patterns on masks and foreign substances on wafers. The Multi-Beam Iris model captures sub µm defects and can measure the size, shape and magnitude of the defect, as well as its position relative to the mask mark. It is also capable of counting particles and detecting defects on single- and double- sided wafers. It can also measure the size, shape, and type of each defect, helping determine the origin of the foreign substances. The User Interface of TOPCON Vi-SW200C helps the operator to monitor the progress of the inspection. It provides a comprehensive set of tools to facilitate data analysis and manual review of detected defects. It also includes data scan libraries which can be used to compare and store results from different inspections. The equipment is equipped with an auto-alignment system which simplifies the process of positioning between different layers, as well as a 3D microscope that allows the operator to view any kind of feature or defect while still in its original position. It also has an in-line optical inspection feature which can be used to quickly check wafers for prior to full inspection. Vi-SW200C unit is designed for fast, accurate, and reliable defect detection on semiconductor masks and wafers. It provides a complete imaging, detection, analysis, and reporting solution which results in improved yield in production and fewer defective chips.