Used TOPCON WM 1700 #9106562 for sale

TOPCON WM 1700 is a state-of-the-art mask and wafer inspection equipment from TOPCON that provides accurate and reliable automated wafer inspection and mask inspection services. This system offers a variety of advanced features and exceptional performance to verify that the wafer and mask designs produced meet the highest standards. The unit has a resolution of 5 microns with a field of view of up to two by two inches. The large field of view allows for multiple simultaneous inspection points, allowing designers to easily detect defects in both the top layer and the lower levels of a mask or wafer. Additionally, the machine offers advanced features such as automatic defect classification and real-time defect analysis, allowing users to quickly identify and address defects. WM 1700 also has a number of features designed to ensure accuracy and repeatability in the inspection process. The tool's motion control asset allows for precise positioning of the imaging lens, enabling accurate inspection image capture and ensuring inspection accuracy. Additionally, the model's laser interferometer technology provides precise positioning and alignment, ensuring repeatable results. TOPCON WM 1700 also provides advanced image capture capabilities, featuring automatic focus and exposure determination, advanced image enhancement algorithms, and support for both darkfield and brightfield imaging. This allows the equipment to capture a wide variety of image types, from defect inspection to complex 3D imaging, making it ideal for a variety of applications. Finally, the system is designed with a robust and modular architecture, allowing for customization, scalability, and ease of use. This ensures that WM 1700 can meet the unique needs of each user, allowing for a wide variety of mask and wafer inspection applications. In conclusion, TOPCON WM 1700 is a state-of-the-art mask and wafer inspection unit that provides a variety of advanced features and exceptional performance. It is designed for precise and repeatable inspection, with features such as precise motion control, laser interferometer technology, and advanced image capture capabilities, making it ideal for a wide range of mask and wafer inspection applications.