Used TOPCON WM 2500 #9227183 for sale
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ID: 9227183
Wafer Size: 6"
Vintage: 1999
Wafer particle inspection system, parts machine, 6"
1999 vintage.
TOPCON WM 2500 is a mask & wafer inspection equipment developed by TOPCON Corporation. It is capable of multiple wafer and mask pattern analysis work in a single system. The unit is designed to analyze pattern alignment errors on wafer substrates, including Gallium Nitride (GaN) substrates. WM 2500 makes use of various features to perform its wafer and mask inspection tasks. Its large working area allows for easy alignment and viewing of wafer and mask patterns. It also features high resolution optics, high-speed digital signal processing, and a three-dimensional laser auto-focus unit. The high resolution optics allow for sharp images to be obtained for precise analysis and measurement of wafer and mask patterns. The signal processing unit allows for fast image data analysis and classification. The laser auto-focus unit makes it possible to measure and adjust the focus automatically. The machine offers comprehensive defect inspection capabilities as well. Defects are classified according to types, size, shape and area. The tool also provides wafer map information and defect summary reports. The defect inspection data can, in turn, be used for further analysis of process correlations. The asset can also analyze wafer and mask patterns for quality assurance and design purposes. It features high accuracy measurement tools such as fiducial marks, line widths, and image segmentation. Additionally, TOPCON WM 2500 includes advanced imaging features such as photomask image integration and 3D image formation. WM 2500 requires minimal maintenance and is easy to use and configure. The model can store user preferences and automation instructions, allowing for streamlined operation. It includes a software suite comprised of various tools for easy operation and analysis. In conclusion, TOPCON WM 2500 is a versatile mask & wafer inspection equipment which is designed to meet the requirements of various mask and wafer manufacturing tasks. It offers high resolution optics, comprehensive defect inspection capabilities and image analysis features, which make it an invaluable tool for the semiconductor industry.
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