Used TOPCON WM 2500 #9239634 for sale
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ID: 9239634
Wafer Size: 6"
Vintage: 2001
Wafer particle inspection system, 6"
2001 vintage.
TOPCON WM 2500 is a mask & wafer Inspection equipment designed to perform 2D and 3D metrology and defect detection on semiconductor wafers. The system is a fully automated and ultra-precise inspection unit that enables high accuracy and fast throughput with a large range of defect detection capabilities. The machine combines a high quality motorized XYZ stage, advanced High-NA optics, and an automatic wafer mapping feature to prevent any false registration of wafer movement. The inspection tool is capable of detecting a wide variety of defects, such as nodules, pits, voids, scratches, pull-backs and other non-ideal features such as dicing notches or particles on the wafer surface. WM 2500 is equipped with a 5 Megapixel camera which enables high-resolution depth imaging with a maximum resolution of 2.5 microns. A variety of wafer sizes from 4" to 8" can be easily accommodated thanks to the motorized Z-axis. It allows for the inspection of wafers of varying thicknesses. This is especially helpful when inspecting larger wafers which require additional magnifications to inspect various defects. The automated mapping feature coupled with the asset's software ensures an accurate registration of the wafer's position and movement at each exposure. The model is supported by robust software that automatically checks the entire wafer surface allowing for fast detection of any front or back side non-ideal features. The software is user-friendly and allows for infinite control over the automated processes, making the equipment very versatile and efficient. The system can easily be integrated into cleanroom environments and is fully powered and auto-centering. In addition, the unit can be operated with any standard laptop computer and has a comprehensive built-in data logging machine. TOPCON WM 2500 provides a reliable and precise solution for wafer inspection needs. This automated tool ensures fast and accurate detection of any non-ideal features on semiconductor wafers, making it the ideal choice for any manufacturing environment.
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